氧化铝对硅酸的吸附去除机理
韩珏,杜聪,刘忠新,白淑琴
Adsorptive removal mechanism of alumina on silicic acid
Jue Han,Cong Du,Zhongxin Liu,Shuqin Bai
表1
Langmuir、Freundlich和Temkin吸附等温方程拟合参数
Langmuir
Freundlich
Temkin
Q
m
= 39.82 mg/g
n
f
= 3.535
A
T
=0.575
b
=0.048
K
f
=8.587
B
T
=7.969
r
2
=0.935
r
2
=0.848
r
2
=0.891