摘要:
本研究通过简便的水热和煅烧两步法合成了CeO2,采用扫描电子显微镜(SEM)、X射线衍射(XRD)对CeO2的微观形貌和晶型结构进行了表征;为提高实际制药废水深度氧化处理的效果,Oxone试剂被引入UV/CeO2氧化体系。研究结果表明,UV辐照协同CeO2可高效活化Oxone试剂产生SO4 ·-、SO5 ·-和·OH等多种活性氧化物质,实现制药废水深度氧化的目的;溶液pH、Oxone用量、CeO2用量、反应温度等因素影响制药废水COD和TOC的去除效果,在制药废水初始COD为326 mg/L、TOC为132.6 mg/L、Oxone质量浓度为1.0 g/L、CeO2质量浓度为0.6 g/L、pH为6.86、温度为30 ℃、反应时间为60 min时,UV/CeO2耦合Oxone氧化工艺对实际制药废水COD的去除率达到90.21%,TOC去除率为76.99%。UV/CeO2耦合Oxone氧化具有潜在的工业应用前景。
关键词:
紫外光,
二氧化铈,
Oxone试剂,
制药废水
Abstract:
The ceric dioxide(CeO2)material was synthesized by a convenient two-step method of hydrothermal and calcination processes. The micromorphology and crystal structure of CeO2 material were characterized by scanning electron microscopy(SEM) and X-ray diffraction (XRD). In order to improve the efficiency of advanced treatment for pharmaceutical wastewater,Oxone was also introduced into the UV/CeO2 oxidation system. The research results showed that UV/CeO2 could effectively activate the Oxone to produce more reactive oxidizing species,such as SO4 ·-,SO5 ·- and·OH,causing the advanced oxidation of pharmaceutical wastewater. The influencing factors on COD and TOC removal,including the solution pH,Oxone dosage,CeO2 dosage and temperature,were discussed. The COD removal efficiency and TOC removal efficiency of pharmaceutical wastewater could reach 90.21% and 76.99% respectively,under conditions that the initial COD 326 mg/L,TOC 132.6 mg/L,Oxone dosage 1.0 g/L,CeO2 doseage 0.6 g/L,pH 6.86,reaction temperature 30 ℃ and reaction time 60 min. UV/CeO2 coupled Oxone oxidation had potential industrial applications.
Key words:
UV,
CeO2,
Oxone reagent,
pharmaceutical wastewater
中图分类号:
王文富, 华琼, 王程豫, 赵晓辉, 郑宾国. UV/CeO2耦合Oxone深度处理制药废水的研究[J]. 工业水处理, 2022, 42(6): 146-150.
Wenfu WANG, Qiong HUA, Chengyu WANG, Xiaohui ZHAO, Binguo ZHENG. Advanced treatment of pharmaceutical wastewater by UV/CeO2 and Oxone coupling system[J]. Industrial Water Treatment, 2022, 42(6): 146-150.