摘要：

采用色谱 -质谱联用分析仪和电感耦合等离子体发射光谱仪分析和鉴定了光致抗蚀剂废水中的污染物。结果表明,污染物的去除或降解是铁的还原、铁的电化学腐蚀、活性炭吸附和铁离子、亚铁离子混凝沉淀等机理共同作用的结果 ;废水中铜、锌、钒、锡等无机污染物的去除率分别为100%,47.0%,100%,98.1%。邻苯二甲酸酐、聚丙二醇、丁烯酸、苯甲酸等有机物去除率分别为100 %,29.9%,27.7%,56.5%。硝基苯、2-氯代苯甲酸等污染物的降解率分别为100%。

关键词: 污染物, 光致抗蚀剂废水, 铁屑, 去除机理

Abstract:

The inorganic and organic pollutants in the photoresists containing wastewater after the treatment of the iron chipping micro electrolysis are analyzed by ICP-AES and GC-MS. The analysis shows that there are several kinds of mechanisms for the removal or degradation of contaminants, such as the electrochemical corrosion, active carbon absorption, coagulation sedimentation of ferric ion and ferrous ion, and the reduction of iron etc .. The removal efficiency for heavy metals such as copper, zinc, vanadium and tin are 100%, 47%, 100%, 98.1%, respectively. The removal efficiency for phthalic anhydride, homologues of polypropylene glycol, 2 butenoic acid, benzoic acid are 100%,29.9%,27.7% and 56.5%,respectively.The degradability for nitrobenzene, 2 chloro butenoic acid are all 100%.

Key words: pollutants, photoresists containing wastewater, iron chipping, mechanism of removal

中图分类号: 

• X703.1