摘要：
从电镀废水、含氰污泥及电镀车间渡槽液中分离筛选出三株高效降氰真菌,并对其中Fw菌株氰化物降解条件进行了研究。研究结果表明,该菌株的最佳降氰条件为温度20-30℃、pH5-7、摇床转数100-180r/min、接种量6%-20%。在最佳降氰条件下,Fw菌株降氰率达到95%以上,剩余氰化物质量浓度低于1mg/L。该菌株可以直接利用CN-作为碳源和氮源,并且在培养基中不外加碳源和氮源时,氰化物剩余质量浓度分别为0.25mg/L和0.49mg/L,达到国家一级排放标准。本研究结果可以作为利用真菌处理含氰废水的依据。
关键词:
降氰真菌,
氰化物,
分离筛选,
最佳降氰条件
Abstract:
Three highly effective cyanide-degrading fungus are isolated from electroplating wastewater, cyanide-contaminated soil and liquid in plating bath. The cyanide-degrading conditions of strain Fw as investigated. The results show that the optimum cyanide-degrading conditions are as follows: temperature 20-30℃,pH 5-7, rotating rate 100-180 r/min,inoculum 6%-20%. Under the optimum cyanide-degrading conditions, the CN-degradation rate of strain Fw is above 95%, the residual CN- concentration is less than 1 mg/L. Strain Fw can utilize CN- as carbon source and nitrogen source. When no other carbon and nitrogen sources are added in the medium, the residual CN- is 0.25 mg/L and 0.49 mg/L, meeting the requirement of 1st grade discharge standard. Some new bases for the problems of how to use highly effective fungus to treat cyanide-containing wastewater have been obtained.
Key words:
cyanide-degrading fungus,
cyanide,
isolation and screen,
the optimum cyanide-degrading conditions
中图分类号:
季军远, 王向东, 李福德, 曾媛, 乔勇. 高效降氰真菌的分离筛选及降氰条件研究[J]. 工业水处理, 2005, 25(7): 35-37.
Ji Junyuan, Wang Xiangdong, Li Fude, Zeng Yuan, Qiao Yong. Isolation screen and application of highly-effective cyanide-degrading fungus[J]. INDUSTRIAL WATER TREATMENT, 2005, 25(7): 35-37.