工业水处理 ›› 2013, Vol. 33 ›› Issue (9): 15-19. doi: 10. 11894/1005-829x. 2013. 33(9). 15

• 专论与综述 • 上一篇    下一篇

水中As(Ⅲ)氧化的研究进展

刘桂芳, 于树芳, 王春丽, 任芝军, 李嘉, 孙亚全, 高远   

  1. 哈尔滨工程大学航天与建筑工程学院, 黑龙江哈尔滨 150001
  • 收稿日期:2013-06-06 出版日期:2013-09-20 发布日期:2013-10-17
  • 作者简介:刘桂芳(1980- ), 博士, 副教授。E-mail:liuguifang@126.com。
  • 基金资助:

    中央高校基本科研业务费专项资金(HEUCF1124, HEUCF100213);哈尔滨工程大学基础研究基金(HEUFT09003)

Research progress in oxidation of arsenic(Ⅲ) in water

Liu Guifang, Yu Shufang, Wang Chunli, Ren Zhijun, Li Jia, Sun Yaquan, Gao Yuan   

  1. College of Aerospace and Civil Engineering, Harbin Engineering University, Harbin 150001, China
  • Received:2013-06-06 Online:2013-09-20 Published:2013-10-17

摘要:

由于水中As(Ⅲ)的直接去除较难, 处理过程中多将As(Ⅲ)氧化成As(Ⅴ)后进行去除。重点介绍了水中As(Ⅲ)的两类氧化法(氧化剂直接氧化法和高级氧化法)的原理和研究进展。其中氧化剂直接氧化法中主要介绍了H2O2、锰氧化物、铁及其氧化物和氯氧化物等氧化剂;高级氧化间接氧化法中主要介绍了TiO2光催化氧化、电催化氧化、超声波氧化和过硫酸盐氧化。最后, 对As(Ⅲ)氧化的发展方向进行了展望。

关键词: 砷, 氧化剂, 直接氧化, 高级氧化

Abstract:

Since the direct removal of As(Ⅲ) from aqueous solution is rather difficult, than the removal of As(Ⅴ). Therefore, in the course of treatment, an effective way is that As(Ⅲ) has to be oxidized to As(Ⅴ) prior to its removal. The theory and research progress of the direct oxidation(i.e.oxidizer oxidation) and indirect oxidation (i.e.advanced oxidation process) of aqueous As(Ⅲ) are viewed in detail. The direct oxidation of As(Ⅲ) mainly includes H2O2 oxidation, manganese oxidation, iron and its oxides oxidation, chlorine oxides oxidation. The advanced indirect oxidation of As(Ⅲ) includes TiO2 photocatalytic oxidation, electro-catalytic oxidation, ultrasonic oxidation and persulfate oxidation. At the end, the developing direction of As(Ⅲ) oxidation is forecast.

Key words: arsenic, oxidant, direct oxidation, advanced oxidation

中图分类号: