Industrial Water Treatment ›› 2025, Vol. 45 ›› Issue (3): 65-72. doi: 10.19965/j.cnki.iwt.2024-0123

• RESEARCH AND EXPERIMENT • Previous Articles     Next Articles

Pilot study on treatment and near zero discharge of gallium arsenide wafer processing wastewater

Weichao LI1,2(), Jun YANG3, Hai CHANG4, Tianchi GENG2,5, Yuchong WU2,5, Jingjing LIU2,5, Yuyu WANG2,5, Yun WU1,2,5(), Yingbo CHEN1,2   

  1. 1. School of Materials Science and Engineering, Tiangong University, Tianjin 300387, China
    2. State Key Laboratory of Separation Membranes and Membrane Processes, Tiangong University, Tianjin 300387, China
    3. CenerTech Tianjin Chemical Research and Design Institute Co. , Ltd. , Tianjin 300131, China
    4. China Railway Construction Financial Services Technology (Tianjin) Co. , Ltd. , Tianjin 300308, China
    5. School of Environmental Science and Engineering, Tiangong University, Tianjin 300387, China
  • Received:2024-07-04 Online:2025-03-20 Published:2025-03-24
  • Contact: Yun WU

砷化镓晶片加工废水处理及近零排放中试研究

李伟超1,2(), 杨军3, 常海4, 耿天驰2,5, 武玉冲2,5, 刘晶晶2,5, 王妤予2,5, 吴云1,2,5(), 陈英波1,2   

  1. 1. 天津工业大学材料科学与工程学院,天津 300387
    2. 天津工业大学分离膜与膜过程国家重点 实验室,天津 300387
    3. 中海油天津化工研究设计院有限公司,天津 300131
    4. 中铁建金服科技 (天津)有限公司,天津 300308
    5. 天津工业大学环境科学与工程学院,天津 300387
  • 通讯作者: 吴云
  • 作者简介:

    李伟超(1996— ),博士,E-mail:

  • 基金资助:
    国家重点研发计划项目(2023YFC3207003); 国家自然科学基金项目(51878448)

Abstract:

In the process of gallium arsenide wafer, a large number of toxic and harmful organic wastewater with arsenic was produced. In this paper, the process of “arsenic removal pretreatment+biochemical treatment+advanced treatment” was used to achieve the standard treatment of gallium arsenide wafer processing wastewater and near-zero discharge. The arsenic removal was achieved by the pretreatment process of “two-stage coagulation+ion exchange resin”. The arsenic removal rate reached more than (99.998±0.003)%, and the arsenic content in the effluent reached the discharge standard. Biochemical treatment adopted the process of “O3 oxidation+hydrolytic acidification+biological contact oxidation”, the COD removal rate was (95.7±0.3)%, and the effluent could meet local emission standards. The advanced treatment adopted “ultrafiltration+two-stage reverse osmosis+triple-effect evaporation and crystallization” to realize the reuse of wastewater and resource recovery. By calculation, the cost of treating arsenic-containing organic wastewater was about 36.11 yuan/m3. This pilot study verified the feasibility of resource recovery and near-zero discharge of gallium arsenide wafer processing wastewater, and provided reliable and effective technical support for the standard discharge, resource recovery and utilization of arsenic-containing wastewater in the industry.

Key words: gallium arsenide wafer, arsenic-containing wastewater, near-zero discharge, double-membrane technology, evaporation and crystallization

摘要:

砷化镓晶片加工生产过程中,产生大量有毒有害的含砷有机废水。采用“除砷预处理+生化处理+深度处理”工艺对砷化镓晶片加工废水进行达标处理及近零排放的中试研究。除砷预处理采用“两级混凝+离子交换树脂”工艺,砷去除率达(99.998±0.003)%以上,出水砷含量稳定达到排放标准。生化处理采用“O3氧化+水解酸化+生物接触氧化”工艺,COD去除率为(95.7±0.3)%,出水水质满足当地园区纳管标准。深度处理采用“超滤+两级反渗透+三效蒸发结晶”,实现废水回用及资源回收。经计算,该中试工艺处理含砷有机废水的成本约为36.11元/m3。该中试研究验证了砷化镓晶片加工生产废水的资源回收和近零排放的可行性,为该行业含砷废水的达标排放和资源回收利用提供了可靠的工艺支持和技术保障。

关键词: 砷化镓晶片, 含砷废水, 近零排放, 双膜法, 蒸发结晶

CLC Number: