摘要：

以过硫酸铵水溶液为氮源（N）、硫源（S），通过阳极氧化法在不同电压下成功制备出了N-S/TiO₂薄膜。采用SEM、XRD、XPS和UV-vis NIR对TiO₂薄膜进行表征分析，并研究了其在太阳光下对甲基橙（MO）的降解性能。结果表明，随着氧化电压的升高，N、S掺杂浓度逐渐增加，TiO₂薄膜逐渐变成多孔结构且向锐钛矿晶相转化。氧化电压为40 V的薄膜降解效果最好，在模拟太阳光下照射20 min，其对MO的脱色率为98.71%，TOC去除率为59.44%。重复使用10次，仍表现出较高的降解效率。

关键词: TiO₂薄膜, 窄带隙, 太阳光, 光电催化, 甲基橙

Abstract:

Using ammonium persulfate electrolyte as the sources of nitrogen(N) and sulfur(S), N-S/TiO₂ films were successfully prepared via anodization at different voltages. The N-S/TiO₂ films were characterized by SEM, XRD, XPS and UV-vis NIR, and their degradation performance of methyl orange(MO) under sunlight were investigated. The results showed that with the increase of oxidation voltage, the doping concentrations of N and S gradually increased, and the TiO₂ film became porous structure and transformed into the anatase crystal phase. The film prepared with a voltage of 40 V had the highest degradation effect:under simulated sunlight for 20 min, the MO decolorization rate had reached 98.71%, and the TOC removal rate reached 59.44%. High degradation efficiency was still showed for MO after reusing ten times.

Key words: TiO₂ films, narrow-gap, sunlight, photoelectrocatalytic, methyl orange

中图分类号: 

• X703.1