摘要：

电子级超纯水在半导体制造中用量很大，目前超纯水生产以“预处理+反渗透（RO）+电除盐（EDI）”为主单元的长流程工艺为主。在此基础上，提出了一种以中空纤维纳滤（HFNF）和平板真空多效膜蒸馏（VMD）替代EDI之前所有工艺段的短流程生产工艺，把超纯水生产工艺从原长流程的12个以上工艺段减少至6个以下。研究结果表明，以HFNF+VMD作预处理的产水电导率低于4 µS/cm，完全满足EDI的进水要求；在出水水质不变的情况下，短流程生产工艺减少了工艺段，超纯水产水量提高了44.6%，进而可以降低设备投资，而且使维护变得简单且经济；更重要的是短流程生产工艺故障风险位点减少，超纯水工艺和水质更加稳定。

关键词: 超纯水生产, 半导体制造, 中空纤维纳滤, 平板真空多效膜蒸馏, 短流程工艺

Abstract:

Electronic-grade ultrapure water（UPW） is used extensively in semiconductor manufacturing. At present，the long process including main units of “pretreatment + reverse osmosis（RO） + electro-deionization（EDI）” is predominant in UPW production. On this basis，a compact production process was proposed，which replaced all the process units before EDI by hollow fiber nanofiltration（HFNF） and plate-frame vacuum multi-effect membrane distillation（VMD），and the UPW production process was reduced from more than 12 units in the original long process to less than 6. The pilot testing results indicated that the conductivity of produced water from HFNF and VMD was less than 4 µS/cm，completely meeting feed criteria of EDI unit. With the same effluent quality，the compact production process reduced the number of process units and increased the amount of UPW by 44.6%，thereby reducing equipment investment and making maintenance simple and economical. The most important advantage of the compact process was decreasing malfunction points and making whole process and UPW quality more stable.

Key words: ultrapure water production, semiconductor manufacturing, hollow fiber nanofiltration, plate-frame vacuum multi-effect membrane distillation, compact process

中图分类号: 

• TU991.41